SYSTEMS AND METHODS FOR RADIAL AND ORIENTAL CONTROL OF PLASMA UNIFORMITY
A system includes a process chamber, a housing defining a waveguide cavity, and a first electrically conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment devices that can adjust at least a position of the first con...
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Main Authors | , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
27.05.2022
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Subjects | |
Online Access | Get full text |
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