SYSTEMS AND METHODS FOR RADIAL AND ORIENTAL CONTROL OF PLASMA UNIFORMITY

A system includes a process chamber, a housing defining a waveguide cavity, and a first electrically conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment devices that can adjust at least a position of the first con...

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Bibliographic Details
Main Authors TRAN TOAN, KOBAYASHI SATORU, LUBOMIRSKY DMITRY, PARK SEYONG, SUGAI HIDEO, KALNIN NIKOLAI
Format Patent
LanguageChinese
English
Published 27.05.2022
Subjects
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