SYSTEMS AND METHODS FOR RADIAL AND ORIENTAL CONTROL OF PLASMA UNIFORMITY

• Main Authors: TRAN TOAN, KOBAYASHI SATORU, LUBOMIRSKY DMITRY, PARK SEYONG, SUGAI HIDEO, KALNIN NIKOLAI
• Format: Patent
• Language: Chinese; English
• Published: 27.05.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A system includes a process chamber, a housing defining a waveguide cavity, and a first electrically conductive plate within the housing. The first conductive plate faces the process chamber. The system also includes one or more adjustment devices that can adjust at least a position of the first conductive plate, and a second conductive plate coupled with the housing between the waveguide cavity and the process chamber. Electromagnetic radiation may propagate from the waveguide cavity into the process chamber via an aperture in the second conductive plate. The system also includes a dielectric plate enclosing the process chamber spaced apart from the waveguide cavity, and one or more groups of electronic devices that transmit electromagnetic radiation into the waveguide cavity. A plasma is formed when at least one process gas is within the chamber and electromagnetic radiation propagates from the waveguide cavity into the process chamber. 一种系统包括工艺腔室、界定波导空腔的壳体、和在壳体内的第一导电板。第一导电板面向工艺腔室。所述系统还包括至少可调整第一导电板的位置的一个或多个