CONTROL DEVICE FOR MONITORING A MACHINE
The invention relates to a control device for monitoring a machine and for monitoring the emission performance of a machine, wherein the monitoring is carried out on the basis of a comparison of comparing the relative position of a criterion based on measured and/or operating values of the machine w...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
20.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a control device for monitoring a machine and for monitoring the emission performance of a machine, wherein the monitoring is carried out on the basis of a comparison of comparing the relative position of a criterion based on measured and/or operating values of the machine with respect to a nominal value of the machine. The control device (1) according to the invention for monitoring a machine (2) is designed and designed to carry out the following steps:-detecting (S10) measured values and/or operating values of the machine (2),-ascertaining (S20) a criterion on the basis of the detected measured values and/or operating values,-comparing (S30) the criterion with a nominal value, wherein the nominal value represents a functionally normal state of the machine (2), and determining (S31) a relative position of the standard with respect to the nominal value, and ascertaining (S40) a state of the machine (2) on the basis of the result of the comparison and the determined relative position. |
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Bibliography: | Application Number: CN202111374855 |