Double-sided TOPCon photovoltaic cell based on n-type silicon substrate

The invention discloses a double-sided TOPCon photovoltaic cell based on an n-type silicon substrate. The double-sided TOPCon photovoltaic cell comprises a first tunneling layer, an n-type doped polycrystalline silicon layer, a first passivation anti-reflection layer and a back electrode which are s...

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Main Authors QIAO DAYONG, LIU DAWEI, HU JICHAO, GUO YONGGANG, SONG ZHICHENG, NI YUFENG, MA SHAOHUA
Format Patent
LanguageChinese
English
Published 17.05.2022
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Abstract The invention discloses a double-sided TOPCon photovoltaic cell based on an n-type silicon substrate. The double-sided TOPCon photovoltaic cell comprises a first tunneling layer, an n-type doped polycrystalline silicon layer, a first passivation anti-reflection layer and a back electrode which are sequentially arranged on the back surface of an n-type silicon wafer, the double-sided TOPCon photovoltaic cell further comprises a p-type doped emitter layer, a second tunneling layer, a p-type CuAlO2 layer, a second passivation anti-reflection layer and a front electrode which are sequentially arranged on the front face of the n-type silicon wafer. In the technical scheme of the invention, in the front structure of the double-sided n-type TOPCon photovoltaic cell, a p-type CuAlO2 layer is adopted to replace an existing heavily doped polycrystalline silicon layer, and the p-type CuAlO2 layer has a relatively large forbidden bandwidth (gt; and the film has higher transmittance in a visible light range, and can impro
AbstractList The invention discloses a double-sided TOPCon photovoltaic cell based on an n-type silicon substrate. The double-sided TOPCon photovoltaic cell comprises a first tunneling layer, an n-type doped polycrystalline silicon layer, a first passivation anti-reflection layer and a back electrode which are sequentially arranged on the back surface of an n-type silicon wafer, the double-sided TOPCon photovoltaic cell further comprises a p-type doped emitter layer, a second tunneling layer, a p-type CuAlO2 layer, a second passivation anti-reflection layer and a front electrode which are sequentially arranged on the front face of the n-type silicon wafer. In the technical scheme of the invention, in the front structure of the double-sided n-type TOPCon photovoltaic cell, a p-type CuAlO2 layer is adopted to replace an existing heavily doped polycrystalline silicon layer, and the p-type CuAlO2 layer has a relatively large forbidden bandwidth (gt; and the film has higher transmittance in a visible light range, and can impro
Author HU JICHAO
MA SHAOHUA
GUO YONGGANG
LIU DAWEI
SONG ZHICHENG
NI YUFENG
QIAO DAYONG
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– fullname: MA SHAOHUA
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DocumentTitleAlternate 一种基于n型硅基底的双面TOPCon光伏电池
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RelatedCompanies NORTHWEST INDUSTRY UNIVERSITY
XIAAN SOLAR POWER BRANCH COMPANY OF HYDROPOWER DEVELOPMENT LIMITED-RESPONSIBILITY COMPANY AT UPSTREAM OF YELLOW RIVER OF QINGHAI
YELLOW RIVER UPSTREAM HYDROPOWER DEVELOPMENT LIMITED-RESPONSIBILITY COMPANY OF NATIONAL ELECTRICITY INVESTMENT GROUP
XINNING SOLAR POWER BRANCH COMPANY OF HYDROPOWER DEVELOPMENT LIMITED-RESPONSIBILITY COMPANY AT UPSTREAM OF YELLOW RIVER OF QINGHAI
YELLOW RIVER UPSTREAM HYDROPOWER DEVELOPMENT LIMITED-RESPONSIBILITY COMPANY IN QINGHAI
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Snippet The invention discloses a double-sided TOPCon photovoltaic cell based on an n-type silicon substrate. The double-sided TOPCon photovoltaic cell comprises a...
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title Double-sided TOPCon photovoltaic cell based on n-type silicon substrate
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