Double-sided TOPCon photovoltaic cell based on n-type silicon substrate
The invention discloses a double-sided TOPCon photovoltaic cell based on an n-type silicon substrate. The double-sided TOPCon photovoltaic cell comprises a first tunneling layer, an n-type doped polycrystalline silicon layer, a first passivation anti-reflection layer and a back electrode which are s...
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Main Authors | , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
17.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a double-sided TOPCon photovoltaic cell based on an n-type silicon substrate. The double-sided TOPCon photovoltaic cell comprises a first tunneling layer, an n-type doped polycrystalline silicon layer, a first passivation anti-reflection layer and a back electrode which are sequentially arranged on the back surface of an n-type silicon wafer, the double-sided TOPCon photovoltaic cell further comprises a p-type doped emitter layer, a second tunneling layer, a p-type CuAlO2 layer, a second passivation anti-reflection layer and a front electrode which are sequentially arranged on the front face of the n-type silicon wafer. In the technical scheme of the invention, in the front structure of the double-sided n-type TOPCon photovoltaic cell, a p-type CuAlO2 layer is adopted to replace an existing heavily doped polycrystalline silicon layer, and the p-type CuAlO2 layer has a relatively large forbidden bandwidth (gt; and the film has higher transmittance in a visible light range, and can impro |
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Bibliography: | Application Number: CN202210009276 |