Memory cells, capacitive memory structures and methods thereof
According to various aspects, there is provided a memory cell comprising: a first electrode; a second electrode; and a memory structure disposed between the first electrode and the second electrode, the first electrode, the second electrode, and the memory structure forming a memory capacitor, in wh...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
06.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | According to various aspects, there is provided a memory cell comprising: a first electrode; a second electrode; and a memory structure disposed between the first electrode and the second electrode, the first electrode, the second electrode, and the memory structure forming a memory capacitor, in which at least one of the first electrode and the second electrode includes: a first electrode layer including a first material having a first microstructure; a functional layer in direct contact with the first electrode layer; and a second electrode layer in direct contact with the functional layer, the second electrode layer including a second material having a second microstructure different from the first microstructure.
根据各个方面,提供了一种存储器单元,该存储器单元包括:第一电极;第二电极;以及设置在第一电极与第二电极之间的存储器结构,第一电极、第二电极和存储器结构形成存储器电容器,其中,第一电极和第二电极中的至少一个包括:包括具有第一微结构的第一材料的第一电极层;与第一电极层直接接触的功能层;以及与功能层直接接触的第二电极层,第二电极层包括具有不同于第一微结构的第二微结构的第二材料。 |
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Bibliography: | Application Number: CN202111239931 |