Substrate comprising diamond layer and composite layer of diamond and silicon carbide and optionally silicon

• Main Authors: TANNER CHARLES D, EISSLER ELGIN E, XU WEN-QING, KRAISINGER CHARLES J, LIU, CHENG, AGHAYAN, MICHAEL
• Format: Patent
• Language: Chinese; English
• Published: 29.04.2022
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; LIME, MAGNESIA; MEASURING; METALLURGY; PHYSICS; REFRACTORIES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING; TREATMENT OF NATURAL STONE

The multilayer substrate includes a diamond layer CVD grown on the composite layer. The composite layer includes diamond and particles of silicon carbide and optionally silicon. The loading level (by volume) of the diamond in the composite layer may be > = 5%, > = 20%, > = 40%, or > = 60%. The multilayer substrate can be used as an optical device; a detector for detecting radiation particles or electromagnetic waves; a device for cutting, drilling, machining, milling, grinding, polishing, coating, bonding, or brazing; a brake device; a sealing strip; a heat conductor; an electromagnetic wave conductor; a chemically inert device for use in a corrosive environment, a strong oxidizing environment, or a strong reducing environment at elevated temperature or at low temperature conditions; or an apparatus for polishing or planarizing other devices, wafers or films. 多层基板包括在复合层上CVD生长的金刚石层。该复合层包括金刚石和碳化硅与任选的硅的颗粒。该复合层中的金刚石的载荷水平(按体积计)可为≥5％、≥20％、≥40％、或≥60％。该多层基板能够用作光学器件；用于检测辐射粒子或电磁波的检测器；用于切割、钻孔、机械加工、碾磨、研磨、抛光、涂布、粘结、或钎焊的装置；