Wafer test probe station and test method thereof

• Main Author: YAN LIUWEI
• Format: Patent
• Language: Chinese; English
• Published: 15.04.2022
• Subjects: MEASURING; MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES; PHYSICS; TESTING

The invention belongs to the technical field of semiconductor preparation, particularly relates to a wafer test probe station and a test method thereof, and aims to solve the problems that wafers are detected one by one in the conventional detection mode, that is to say, the wafers need to be placed, then detected and finally taken down, and the above actions are repeated, so that the detection efficiency is greatly improved. In order to solve the problem that taking and placing of the detection mode wastes a lot of time, the following scheme is provided: the device comprises a workbench, supporting legs are fixedly connected to four corners of the outer wall of the bottom of the workbench, and an electric control box is fixedly connected to the outer wall of the top of the workbench. According to the device, wafers can be loaded by arranging the loading pipe, and the driving mechanism is arranged to drive the rotating pipe to rotate so as to drive the loading pipe to rotate, so that the loading pipe is ensur