Method for producing micro-electro-mechanical structure and micro-electro-mechanical structure

The invention relates to a method for producing a microelectromechanical structure, comprising the following steps: forming a first and a second functional layer having notches, a third functional layer, the structured lateral region of which defines a movable structure, and three insulating layers...

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Bibliographic Details
Main Authors REINMUTH JOCHEN, BOESSENDOERFER RALF
Format Patent
LanguageChinese
English
Published 25.03.2022
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Summary:The invention relates to a method for producing a microelectromechanical structure, comprising the following steps: forming a first and a second functional layer having notches, a third functional layer, the structured lateral region of which defines a movable structure, and three insulating layers arranged therebetween, the insulating layer, the first functional layer and the second functional layer are respectively provided with a transverse region which is arranged below the structured transverse region of the third functional layer and is vertically projected corresponding to the structured transverse region; the insulating layer is etched, the third insulating layer in the lateral region of the third insulating layer is completely removed, and the movable structure is exposed, all notches of the first functional layer arranged in the lateral region of the first functional layer are formed by narrow trenches, the width of which is less than twice the vertical distance between the first and third functiona
Bibliography:Application Number: CN202111055409