Controlled release type microneedle patch and application thereof in desensitization treatment field

The invention provides a controlled-release microneedle patch and application thereof in the field of desensitization treatment. The controlled-release microneedle patch mainly comprises a needle tip layer, a needle body layer and a substrate layer, the needle tip layer is composed of a matrix mater...

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Bibliographic Details
Main Authors ZHOU JIANPING, ZHU XIAOHONG, DING YANG, WANG TIAN, REN JIANYE, ZHANG HUAQING
Format Patent
LanguageChinese
English
Published 08.03.2022
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Summary:The invention provides a controlled-release microneedle patch and application thereof in the field of desensitization treatment. The controlled-release microneedle patch mainly comprises a needle tip layer, a needle body layer and a substrate layer, the needle tip layer is composed of a matrix material, an instant additive and an adjuvant, the needle body layer is composed of a matrix material and an allergen, and the substrate layer is composed of one or more water-soluble polymers. After the controlled-release microneedle patch is inserted into the skin, the needle tip layer is firstly dissolved to release an adjuvant, and the needle body layer is then dissolved to release an allergen. And the release interval of the adjuvant and the allergen reaches 30-60 minutes. The controlled-release microneedle patch prepared by the invention can improve the immune function of antigen presenting cells and enhance the immune response of the body due to the advanced release of the adjuvant, and has the advantages of no p
Bibliography:Application Number: CN202111475998