Large area high density plasma processing chamber for flat panel display

• Main Authors: ANWAR SUHAIL, WU YULUN, SORENSEN CARL A, SEQUEIRA, JEEVAN, PRAKASH, KUDELA JOZEF
• Format: Patent
• Language: Chinese; English
• Published: 01.03.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

Various embodiments described herein provide a cover plate for independent control of plasma density and gas distribution within an interior space of a chamber. The cover assembly includes a gas distribution assembly including a plurality of diffusion plates, portions of which are separated by dielectric plates, wherein each diffusion plate of the plurality of diffusion plates includes a groove formed in a first surface and one or more apertures formed between a surface of the groove and a second surface opposite the first surface. 本文描述的多个实施方式提供了一种用于在腔室的内部空间内的等离子体密度和气体分配的独立控制的盖板。所述盖组件包括气体分配组件，所述气体分配组件包括多个扩散板，所述扩散板的一部分由介电板分隔，其中所述多个扩散板中的每个扩散板包括形成在第一表面中的槽和形成在所述槽的表面和与所述第一表面相对的第二表面之间的一个或多个孔口。