Method and device for measuring and calculating photoetching exposure dose, equipment, control system and medium

• Main Authors: WANG LEIJIE, ZHU YU, CHENG RONG, ZHANG MING, GUO LINBAO
• Format: Patent
• Language: Chinese; English
• Published: 01.02.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CALCULATING; CINEMATOGRAPHY; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a method and device for measuring and calculating scanning interference photoetching exposure dose, equipment, a control system and medium. According to the method and device for measuring and calculating the photoetching exposure dose, the equipment, the control system and the medium,second measurement data of an interference field at an exposure position are obtained according to first measurement data of a radiation beam at the exposure position; a calculation model is established in advance according to the obtained first measurement data and second measurement data; the exposure dose at the exposure position is calculated based on the first measurement data, the second measurement data and the calculation model; and the measurement and calculation accuracy of the exposure dose is improved. 本申请公开了一种扫描干涉光刻曝光剂量的测算方法、装置、测算设备及介质，根据在曝光处的辐射束的第一测量数据，并获取所述曝光处的干涉场的第二测量数据，计算模型提前根据获取的第一测量数据和第二测量数据建立，基于所述第一测量数据、所述第二测量数据和计算模型计算所述曝光处的曝光剂量，提高了曝光剂量的测算准确度。