DEPOSIT REMOVING DEVICE AND DEPOSIT REMOVING METHOD

• Main Authors: YOTSUI TAKUYA, OGAWA FUKUO, MAEKAWA KOICHI
• Format: Patent
• Language: Chinese; English
• Published: 21.01.2022
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; CHEMISTRY; CLEANING; CLEANING IN GENERAL; CRYSTAL GROWTH; METALLURGY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; TRANSPORTING; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

This deposit removing device disclosed herein removes deposits attached to an exhaust pipe for discharging gas from a chamber for manufacturing semiconductor crystals. The present invention is provided with an exhaust port opening/closing means (51a) having: a valve body (69) for opening/closing an exhaust port (24a) communicating with an exhaust pipe; a sealing cover (66) and a fixed stand (65) which accommodate the valve body (69), can introduce an inert gas, and can separate the exhaust port (24a) from the outside; a cylinder (67) for driving the valve body (69); and a cylinder (73) for driving the sealing cover (66) and the fixed stand (65). The exhaust port (24a) is opened/closed by driving the valve body (69) by means of the cylinder (67), and atmospheric air is introduced into the sealing cover (66) by driving the sealing cover (66) or the fixed stand (65) by means of the cylinder (73). 本发明所公开的附着物去除装置去除附着在从制造半导体晶体的腔室排放气体的排气管的附着物。所述附着物去除装置具备排气口开闭机构（51a），其具有：开闭与排气管连通的排气口（24a）的阀体（69）；收纳阀体（69），可导入不活泼气体，可将排