Jet flow polishing device with microscopic positioning function

• Main Authors: ZHANG WENJING, GUO DAN, PAN GUOSHUN, AI TIANCHENG, ZHANG XIN
• Format: Patent
• Language: Chinese; English
• Published: 21.01.2022
• Subjects: ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL; GRINDING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

The invention discloses a jet flow polishing device with a microscopic positioning function, which comprises a multi-axis motion platform, a polishing pool, a spray head, a liquid supply system, a jet flow shooting microscopic imaging system, a microstructure microscopic positioning system and a control host, wherein the multi-axis motion platform is provided with a first mounting table and a second mounting table with adjustable relative positions; the polishing pool is arranged on the first mounting table and used for accommodating a target sample; the spray head is arranged on the second mounting table and used for spraying polishing liquid to form micro jet flow; the liquid supply system is connected with the spray head and used for conveying the polishing liquid to the spray head; the jet flow shooting microscopic imaging system is arranged on the second mounting table and used for dynamically observing the process that the micro jet flow erodes the target sample and measuring the width of the micro jet