MASK AND DEPOSITION APPARATUS HAVING THE SAME

• Main Authors: KIM JEONG-KUK, SONG SEUNG-YONG, HWANG KYU-HWAN, LEE AREUM, KIN TERU
• Format: Patent
• Language: Chinese; English
• Published: 11.01.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The embodiments of the invention relates to a mask and a deposition apparatus having the same. The mask includes a body unit through which a deposition opening is defined, and a protrusion unit through which a pattern opening is defined and which protrudes from a corner of the body unit, wherein a thickness of the body unit is greater than a thickness of the protrusion unit. 本发明的实施例涉及掩模和包括该掩模的沉积装置。所述掩模包括：主体单元，沉积开口被限定穿过所述主体单元；和突出单元，图案开口被限定穿过所述突出单元，并且所述突出单元从所述主体单元的拐角突出，其中所述主体单元的厚度大于所述突出单元的厚度。