RESIN COMPOSITION, FILM, AND MULTILAYER STRUCTURE

• Main Authors: NAKAJIMA TAKUYA, TAKESHITA KEISUKE, KOBAYASHI RYOHEI
• Format: Patent
• Language: Chinese; English
• Published: 21.12.2021
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; GENERAL PROCESSES OF COMPOUNDING; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; WORKING-UP

The present invention provides the following, etc., as resin compositions having excellent gas barrier properties, especially oxygen barrier properties, under high humidity conditions. A resin composition including a hydrophilic resin and a metallic compound, the resin composition being characterized by satisfying formula (1) when made into a film. (1): alpha - beta >= 1, where alpha represents the average metal atom concentration (%) within a depth of 0-9 nm from the surface of the film, and beta represents the average metal atom concentration (%) within a depth of 12-21 nm from the surface of the film. 提供下述等作为高湿度下的气体阻隔性、特别是氧气阻隔性优异的树脂组合物。一种树脂组合物，其特征在于，包含亲水性树脂和金属化合物，将上述树脂组合物制成薄膜时，满足下述式(1)。α-β≥1...(1)上述α表示距离薄膜表面深度0～9nm的范围内的平均金属原子浓度(％)，上述β表示距离薄膜表面深度12～21nm的范围内的平均金属原子浓度(％)。