Liquid supply system and liquid supply method

• Main Authors: FANG JINKUN, CHEN YUKAI, HUANG YANGLUN
• Format: Patent
• Language: Chinese; English
• Published: 21.12.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; NOZZLES; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The invention provides a liquid supply system and a liquid supply method. The liquid supply method comprises the steps that the liquid supply system is used for supplying liquid to a first wafer, the liquid supply system is provided with a liquid containing groove, a spray head and a first filter, and the liquid supply system is used for enabling the liquid to flow from the liquid containing groove to the spray head through the first filter; discontinuing supply of the liquid to the first wafer; the first filter is replaced with a second filter; a circulating system is externally connected to the liquid supply system; the liquid flows through the second filter circularly by using the circulating system; the circulating system is removed from the liquid supply system after the liquid flows through the second filter circularly; and after the circulating system is removed, the liquid supply system is used to supply the liquid to a second wafer. 一种液体供应系统以及液体供应方法。液体供应方法包含使用一液体供应系统提供一液体至一第一晶圆上，其中该液体供应系统具有一液体容置槽、一喷头