Stripping composition

• Main Authors: HUH SOON-BEOM, CHOI SHIN-HYUK, KIM BONG-KYUN, KWON CHANG-WOO, AHN IL-BAE, KIM BYUNG-UK, CHO TAE-PYO, CHOI MIN-WOO
• Format: Patent
• Language: Chinese; English
• Published: 17.12.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A stripping composition is disclosed. The stripping composition of one embodiment comprises, based on the total weight of the stripping composition, 1-50 wt% of a polar solvent; 1% by weight or more and 60% by weight or less of a diol compound; 1% by weight or more and 20% by weight or less of an amine compound; the stripping composition comprises a polar solvent and 1-40 wt% of water, and the polar solvent comprises 10-40 wt% of at least one of N, N-dimethyl propionamide and sulfolane based on the total weight of the stripping composition. The stripping composition can be used in a step of removing a photoresist pattern formed on an electrode, and can exhibit a property of preventing corrosion of the electrode. 公开了一种剥离组合物。一实施例的剥离组合物以剥离组合物的总重量为基准而包括：1重量％以上50重量％以下的极性溶剂；1重量％以上60重量％以下的二醇化合物；1重量％以上20重量％以下的胺化合物；以及1重量％以上40重量％以下的水，其中，以剥离组合物的总重量为基准，极性溶剂以10重量％以上40重量％以下的含量包括N,N-二甲基丙酰胺和环丁砜中的至少一个。剥离组合物可以在形成于电极上的光致抗蚀剂图案的去除工序中使用，并且可以显示出防止电极腐蚀的特性。