CIRCUIT PATTERN FORMATION SHEET, CIRCUIT PATTERN MANUFACTURING DEVICE, CIRCUIT PATTERN MANUFACTURING METHOD, AND CIRCUIT PATTERN MANUFACTURING PROGRAM

The invention is to expose a circuit pattern onto a substrate to form or change the circuit pattern quickly without using a photomask on which the circuit pattern is formed. A circuit pattern manufacturing device comprises formation means of irradiating a circuit pattern formation sheet having an in...

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Bibliographic Details
Main Authors OSHIMA EIJI, KUSAKABE TOMIO
Format Patent
LanguageChinese
English
Published 10.12.2021
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Summary:The invention is to expose a circuit pattern onto a substrate to form or change the circuit pattern quickly without using a photomask on which the circuit pattern is formed. A circuit pattern manufacturing device comprises formation means of irradiating a circuit pattern formation sheet having an insulation sheet base material layer and a mixture agent layer formed of a mixture agent containing a conductive material and a photocurable resin with a beam to form a circuit pattern. The formation means comprises a housing, a laser diode, a prism mirror, an inclined mirror, a bottom face mirror, and a drive mirror, as an optical engine. 通过在不使用其上形成有电路图案的光掩模的情况下使板上的电路图案曝光来快速产生或改变电路图案。提供了一种电路图案制造装置,该电路图案制造装置包括:形成单元,该形成单元通过用光束照射包括绝缘片基材层和混合物层的电路图案形成片来形成电路图案,其中混合物层由包含导电材料和光固化树脂的混合物制成。该形成单元包括壳体、激光二极管、棱镜反射镜、倾斜反射镜、底反射镜和驱动反射镜,作为光学引擎。
Bibliography:Application Number: CN202110690656