Resist stripping liquid composition

The invention belongs to the technical field of surface treatment of films, and particularly relates to a resist stripping liquid composition which is used for surface treatment of films in manufacturing of semiconductor elements, liquid crystal panel elements and the like. The resist stripping liqu...

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Bibliographic Details
Main Authors XIE SHUANGLIN, KENICHI KUBO
Format Patent
LanguageChinese
English
Published 10.12.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention belongs to the technical field of surface treatment of films, and particularly relates to a resist stripping liquid composition which is used for surface treatment of films in manufacturing of semiconductor elements, liquid crystal panel elements and the like. The resist stripping liquid composition comprises (A) a resist stripping solution which is selected from one or more of ethylene carbonate, propylene carbonate, gamma-butyrolactone, cyclopentanone and glycerol carbonate; (B) a surfactant having an oxyalkylene group in the molecule; and (C) a glycol ether-based organic compound having an ethyoxyl group, a butoxyl group, or both of the two substituents in the molecule. The provided resist stripping liquid composition fully utilizes the characteristics of a resist stripping liquid containing an oxyalkylene-based surfactant, dissolves water-insoluble particles such as 1-hexadecanol, which are decomposition products of the oxyalkylene-based surfactant, and prevents re-attachment on the surface
Bibliography:Application Number: CN202111094151