Substrate heat treatment furnace

• Main Authors: KIM JIN-YONG, HA JAE-WOOK, KIM MINOL, ROH HYUNG-RAE, JOONG SI-SHI
• Format: Patent
• Language: Chinese; English
• Published: 07.12.2021
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention discloses a substrate heat treatment furnace. The present invention may comprise a heat treatment furnace having at least one furnace door on the front side and at least one shutter on the rear side so as to place a substrate into a preset space in a chamber or move the substrate from the chamber after a heat treatment process; bearing axes protrude in the horizontal direction of the two sides of the furnace door; up-and-down movement guiding pieces which are provided with up-and-down movement rails for inducing the axes of the bearings in a shaft combination mode and arranged on the two sides of the furnace door in the vertical direction and used for guiding the furnace door to move up and down; and a furnace door operation mechanism part which is provided with a movable cylinder combined with the side surface of the furnace door so as to enable the furnace door to move up and down along the up-down moving track. 本发明公开一种基板热处理炉。本发明可包括：热处理炉，其前侧具有至少一个炉门，且后侧具有至少一个遮挡器，从而将基板放入腔室里的预置空间或从腔室搬出热处理工序结束的基板