Plasma processing device and magnetic conductive assembly and method thereof

The invention discloses a plasma processing device and a magnetic conductive assembly and method thereof. The device comprises a reaction cavity which comprises a reaction cavity side wall; a dielectric window which is positioned on the side wall of the reaction cavity; a coil which is positioned on...

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Bibliographic Details
Main Author YIN SHILIU
Format Patent
LanguageChinese
English
Published 19.11.2021
Subjects
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