Plasma processing device and magnetic conductive assembly and method thereof
The invention discloses a plasma processing device and a magnetic conductive assembly and method thereof. The device comprises a reaction cavity which comprises a reaction cavity side wall; a dielectric window which is positioned on the side wall of the reaction cavity; a coil which is positioned on...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
19.11.2021
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Subjects | |
Online Access | Get full text |
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