Plasma processing device and magnetic conductive assembly and method thereof

The invention discloses a plasma processing device and a magnetic conductive assembly and method thereof. The device comprises a reaction cavity which comprises a reaction cavity side wall; a dielectric window which is positioned on the side wall of the reaction cavity; a coil which is positioned on...

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Bibliographic Details
Main Author YIN SHILIU
Format Patent
LanguageChinese
English
Published 19.11.2021
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The invention discloses a plasma processing device and a magnetic conductive assembly and method thereof. The device comprises a reaction cavity which comprises a reaction cavity side wall; a dielectric window which is positioned on the side wall of the reaction cavity; a coil which is positioned on the dielectric window; and a magnetic conduction assembly which comprises a conductive part located on the dielectric window and a magnetic conduction piece located on the dielectric window, and the magnetic conduction piece is arranged around at least part of the conductive part. According to the invention, the magnetic conduction piece is in contact with the at least conductive part on the dielectric window or is arranged around the at least conductive part on the dielectric window, so that more electromagnetic fields generated by the coil on the dielectric window enter the reaction cavity along the magnetic conductive member, the loss of radio frequency power input into the reaction cavity is reduced, and the w
Bibliography:Application Number: CN202010414741