Image detection method and device

The invention provides an image detection method and device, and relates to an image processing technology. According to the image detection method, each pixel point in a wafer SEM image after photoetching/etching can be grouped in advance according to edge intensity of each pixel point, and then ad...

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Bibliographic Details
Main Authors LI CHEN, FU HAO, YU XUERU, WANG XIUCUI, ZHOU TAO
Format Patent
LanguageChinese
English
Published 19.11.2021
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Summary:The invention provides an image detection method and device, and relates to an image processing technology. According to the image detection method, each pixel point in a wafer SEM image after photoetching/etching can be grouped in advance according to edge intensity of each pixel point, and then adjustment parameters corresponding to each group of pixel points are searched for; since each group of pixel points in the wafer SEM image after the photoetching/etching after high-pass filtering is adjusted according to the adjustment parameters corresponding to each group of pixel points, pixel values of each group of pixel points in the wafer SEM image after the photoetching/etching can be closer to the pixel values of the pixel points in a standard wafer SEM image; and the pixel values of the pixel points in the wafer SEM image after the photoetching/etching are superposed with the pixel values of the adjusted pixel points in the wafer SEM image after the photoetching/etching to generate a second enhanced image
Bibliography:Application Number: CN202111038312