Photosensitive modified chitosan, preparation method and application thereof

The invention provides a preparation method of photosensitive modified chitosan. The method comprises the following steps: 1) dissolving a proper amount of chitosan and acetic acid in deionized water, and uniformly mixing to obtain a mixed solution; 2) adding a proper amount of methacrylic anhydride...

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Bibliographic Details
Main Authors WU MINGBO, XU YANAN, FENG ZHAOXUAN, FANG HAIQIU
Format Patent
LanguageChinese
English
Published 19.11.2021
Subjects
ADDITIVE MANUFACTURING TECHNOLOGY
ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
ADHESIVES
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COMPOSITIONS BASED THEREON
CORRECTING FLUIDS
DERIVATIVES THEREOF
DYES
FILLING PASTES
INKS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
POLISHES
POLYSACCHARIDES
SEPARATION
THEIR PREPARATION OR CHEMICAL WORKING-UP
TRANSPORTING
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:The invention provides a preparation method of photosensitive modified chitosan. The method comprises the following steps: 1) dissolving a proper amount of chitosan and acetic acid in deionized water, and uniformly mixing to obtain a mixed solution; 2) adding a proper amount of methacrylic anhydride into the mixed solution to obtain a reaction mixed solution, and carrying out heat preservation and stirring reaction at 40-80 DEG C, wherein the volume fraction of the methacrylic anhydride in the reaction mixed solution is 1-15%, preferably 6-8%; and 3) after the reaction, adjusting the pH value to 7 by using a sodium bicarbonate solution, and purifying and drying to obtain the photosensitive modified chitosan. The invention further provides the gelatin-photosensitive modified chitosan ink prepared on the basis of the method and application of the gelatin-photosensitive modified chitosan ink. The gelatin-modified chitosan membrane provided by the invention has a microporous structure, shows relatively high (more
Bibliography:Application Number: CN202110956461