Preparation method of silicon-based size-controllable beta-Ga2O3 nanowire
The invention discloses a preparation method of a silicon-based size-controllable beta-Ga2O3 nanowire. The preparation method of the silicon-based size-controllable beta-Ga2O3 nanowire comprises the following steps: firstly, depositing gold (Au) catalyst layers with different thicknesses on a single...
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Main Authors | , , , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
16.11.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a preparation method of a silicon-based size-controllable beta-Ga2O3 nanowire. The preparation method of the silicon-based size-controllable beta-Ga2O3 nanowire comprises the following steps: firstly, depositing gold (Au) catalyst layers with different thicknesses on a single crystal Si (100) substrate, and carrying out in-situ spheroidizing annealing on the catalyst layers to obtain Au nanoparticles with different sizes; and then carrying out magnetron sputtering to grow beta-Ga2O3 nanowires, and carrying out in-situ annealing to obtain the beta-Ga2O3 nanowires with different sizes. The beta-Ga2O3 nanowire with the advantages of fewer defects, high resistivity, uniformity, compactness and the like can be obtained by regulating and controlling the size of the beta-Ga2O3 nanowire. The beta-Ga2O3 nanowires with different sizes prepared by the method show excellent performance in application to solar-blind ultraviolet detectors, can be applied to missile approaching early warning systems, |
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Bibliography: | Application Number: CN202110853195 |