Novel method for modifying silicon-based micro-nano structure

• Main Authors: WANG WEI, ZHENG DEYIN
• Format: Patent
• Language: Chinese; English
• Published: 16.11.2021
• Subjects: MICROSTRUCTURAL TECHNOLOGY; PERFORMING OPERATIONS; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS; TRANSPORTING

The invention relates to a method for modifying a silicon-based micro-nano structure. The method comprises the following steps: providing a heavily doped silicon substrate with a micro-nano structure; performing electrochemical corrosion on the heavily doped silicon substrate so as to form a porous layer on the micro-nano structure; and cleaning with an alkaline solution so as to remove the porous layer. The method provided by the invention can be completed only through a one-step electrochemical corrosion process and a one-step alkaline solution cleaning process. According to the method, the formed silicon-based micro-nano structure can be flexibly modified by accurately controlling process parameters of the electrochemical corrosion process. The defect that the micro-nano structure cannot be effectively modified by a conventional micro-nano machining technology is overcome. According to the method, a new thought is provided for preparation of the functional surface, that is, the functional surface with bett