Production process of ultra-clean high-purity acetone
The invention discloses a production process of ultra-clean high-purity acetone, and relates to the technical field of chemical engineering. The production process comprises the following steps: (1) mixing industrial acetone and a hydrazine aqueous solution, adjusting the temperature to 100-105 DEG...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
12.11.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a production process of ultra-clean high-purity acetone, and relates to the technical field of chemical engineering. The production process comprises the following steps: (1) mixing industrial acetone and a hydrazine aqueous solution, adjusting the temperature to 100-105 DEG C, keeping the temperature, stirring and reacting for 2-3 hours to obtain a reaction solution, forming a low-boiling-point azeotrope from the reaction solution and water under normal pressure, and performing primary rectification separation to obtain acetone azine generated by reaction; (2) hydrolyzing acetone azine under normal pressure to obtain acetone and hydrazine hydrate, and carrying out secondary rectification separation to obtain preliminary acetone; and (3) carrying out adsorption dehydration treatment on the preliminary acetone to obtain high-purity acetone; Compared with the acetone content in industrial acetone, the acetone content of the high-purity acetone produced by the method disclosed by the inve |
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Bibliography: | Application Number: CN202110664816 |