Production process of ultra-clean high-purity acetone

• Main Authors: TANG XIAOCHUN, GE SHIYONG, HE KE
• Format: Patent
• Language: Chinese; English
• Published: 12.11.2021
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMISTRY; METALLURGY; ORGANIC CHEMISTRY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; THEIR RELEVANT APPARATUS; TRANSPORTING

The invention discloses a production process of ultra-clean high-purity acetone, and relates to the technical field of chemical engineering. The production process comprises the following steps: (1) mixing industrial acetone and a hydrazine aqueous solution, adjusting the temperature to 100-105 DEG C, keeping the temperature, stirring and reacting for 2-3 hours to obtain a reaction solution, forming a low-boiling-point azeotrope from the reaction solution and water under normal pressure, and performing primary rectification separation to obtain acetone azine generated by reaction; (2) hydrolyzing acetone azine under normal pressure to obtain acetone and hydrazine hydrate, and carrying out secondary rectification separation to obtain preliminary acetone; and (3) carrying out adsorption dehydration treatment on the preliminary acetone to obtain high-purity acetone; Compared with the acetone content in industrial acetone, the acetone content of the high-purity acetone produced by the method disclosed by the inve