INSPECTION APPARATUS AND METHOD FOR INSPECTING SEMICONDUCTOR DEVICES

• Main Authors: PARK IL-SEOK, JUN CHUNG-SAM, KIM JONG-MIN, LEE SU-YOUNG, SHIN KWANG-IL
• Format: Patent
• Language: Chinese; English
• Published: 29.10.2021
• Subjects: MEASURING; MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES; PHYSICS; TESTING

An inspection apparatus and method of inspecting semiconductor devices are disclosed. The inspection apparatus includes a stage on which a semiconductor device is positioned, a first light source irradiating a high-frequency light onto an inspection area of the semiconductor device to reduce a potential barrier of a PN junction in the semiconductor device, a beam scanner arranged over the semiconductor device and irradiating a charged particle beam onto the inspection area of the semiconductor device to generate secondary electrons, and a defect detector generating a detection image corresponding to the inspection area and detecting, based on a voltage contrast between a reference image and a plurality of detection images, a defect image indicating a defect in the semiconductor device from among the plurality of detection images. 公开了用于检查半导体器件的检查装置和方法。检查装置包括：载物台，其上布置有半导体器件；第一光源，其将高频光照射到半导体器件的检查区域上，以减小半导体器件中的PN结的势垒；束扫描器，被布置在半导体器件上方，并且将带电粒子束照射到半导体器件的检查区域上以产生二次电子；以及，缺陷检测器，其产生与检查区域相对应的检测图像，并且基于参考图像和多个检测图像之间的电压对比，从