COLLOIDAL SILICA AND METHOD FOR PRODUCING SAME

• Main Authors: FUJIMURA YUKA, MICHIWAKI YOSHIKI
• Format: Patent
• Language: Chinese; English
• Published: 26.10.2021
• Subjects: CHEMISTRY; COMPOUNDS THEREOF; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS

The present invention provides: a colloidal silica which contains silica particles that exhibits excellent retainability of surface unevenness under basic conditions, while having excellent compactness; and a production method by which this colloidal silica is able to be produced. The present invention provides a colloidal silica which contains silica particles having surface unevenness, and which is characterized in that: (1) the silica particles have an alkoxy group content of 1,000 ppm or more; and (2) if the silica particles are heated under basic conditions, the decrease rate of the specific surface area is 15.0% or less. 本发明提供含有致密性优异、在碱性条件下的表面凹凸形状的维持性优异的二氧化硅颗粒的胶体二氧化硅、以及能够制造该胶体二氧化硅的制造方法。本发明提供一种胶体二氧化硅，其含有具有表面凹凸形状的二氧化硅颗粒，该胶体二氧化硅的特征在于，(1)上述二氧化硅颗粒的烷氧基的含量为1000ppm以上，(2)上述二氧化硅颗粒在碱性条件下进行加热处理时的比表面积的减少率为15.0％以下。