Separating and discharging device for substrate processing

The present invention relates to a separating and discharging device for substrate processing, which may include: a processing unit for processing a substrate; liquid discharge units connected to the processing unit and configured to separate and discharge the chemical liquid sprayed onto the substr...

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Bibliographic Details
Main Authors KIM JIN-WON, SHIM SUNG-MIN, BAEK SEUNG-DAE, KIM SEONG-HWA, KIM NAM-JIN
Format Patent
LanguageChinese
English
Published 22.10.2021
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Summary:The present invention relates to a separating and discharging device for substrate processing, which may include: a processing unit for processing a substrate; liquid discharge units connected to the processing unit and configured to separate and discharge the chemical liquid sprayed onto the substrate according to components; a liquid guide unit connected to each of the plurality of liquid discharge units and guiding the liquid medicine to the liquid recovery unit; and a gas discharge unit which is connected to the processing unit, discharges the gas present in the processing unit, and separates the discharged liquid medicine and the gas containing the liquid medicine according to the composition of the liquid medicine used for processing the substrate, thereby preventing environmental pollution and omitting reprocessing work. 本发明涉及基板处理用分离排出装置,该基板处理用分离排出装置可包括:处理部,对基板进行处理;液体排出部,与处理部相连接,将向基板喷射的药液按成分分离排出;液体引导部,分别与多个液体排出部相连接,向液体回收部引导药液;以及气体排出部,与处理部相连接,排出存在于处理部的气体,按用于处理基板的药液的成分来分离排出药液和包含药液的气体,从而防止环境污染并省略再处理作业。
Bibliography:Application Number: CN202110410360