Photoresist air isolation system

• Main Authors: LIU CHANGWEI, CHEN SHENGHUA, GENG KETAO
• Format: Patent
• Language: Chinese; English
• Published: 22.10.2021
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

The invention discloses a photoresist air isolation system. The system comprises an air supply device; a plurality of pressure regulating devices comprising glue discharging pressure regulating devices and pressure maintaining devices, wherein each pressure regulating device comprises a pressure reducing valve and a throttling valve, the air supply device is sequentially communicated with the pressure reducing valve and the throttling valve, and the pressure reducing valves of the pressure regulating devices are different in working use pressure; a valve terminal provided with a plurality of first air inlets, wherein the first air inlets are communicated with the pressure regulating device; and a photoresist storage device provided with a second air inlet and a photoresist outlet, wherein the second air inlet is communicated with the valve terminal. According to the invention, the problem that the glue solution is in contact with air when the glue bottle is replaced or the glue solution is refilled is effecti