Gradient micro-nano optical structure preparation method and gradient micro-nano optical structure

• Main Authors: WANG XUESHEN, ZHU ZHENDONG, SUN CHAOYANG
• Format: Patent
• Language: Chinese; English
• Published: 19.10.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The invention relates to a gradient micro-nano optical structure preparation method and a gradient micro-nano optical structure. The preparation method of the gradient micro-nano optical structure comprises the following steps: providing a substrate; spin-coating a photoresist film layer on the surface of the substrate; carrying out first photoetching on the photoresist film layer according to a photoetching mask plate to form a plurality of photoresist structures; processing the plurality of photoresist structures by adopting a backflow process to form a plurality of gradient photoresist structures; performing second photoetching on the plurality of gradient photoresist structures to form a plurality of gradient photoresist microstructures; transferring the structural shapes of the plurality of gradient photoresist microstructures by adopting an imprinting process to form a plurality of gradient microstructure molds; and preparing the gradient micro-nano optical structure according to a plurality of gradient