Pressure flow control device and gas chromatograph thereof

• Main Authors: KANG GEPENG, XU BOLIN
• Format: Patent
• Language: Chinese; English
• Published: 15.10.2021
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

The invention relates to a pressure flow control device and a gas chromatograph thereof. The pressure flow control device comprises a valve seat, the valve seat comprises a plurality of groups of control units, each group of control unit comprises a cavity, a pressure sensor and a gas inlet which communicate with one end of the cavity, and a gas outlet communicating with the other end of the cavity, and a gas resistance unit for stabilizing gas flow is also arranged in each cavity. Gas enters the cavities through the gas inlets and leaves the device through the gas outlets after being subjected to flow stabilization through the gas resistance units, meanwhile, gas pressure is detected through the pressure sensor, and the gas flow is monitored and controlled according to the gas pressure. During assembly, welding operation is not needed, the assembly efficiency is greatly improved, and the problem of air leakage caused by welding is also avoided; and the stability and the reliability of the product are improve