CHARGED PARTICLE BEAM DEVICE

A charged particle beam device is provided. A change in the irradiation position of a charged particle beam can be suppressed by appropriately correcting a positional shift caused by rotation of a sample. The charged particle beam device (10) includes a focused ion beam column (17), a sample holder...

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Bibliographic Details
Main Authors UEMOTO ATSUSHI, KIYOHARA MASAHIRO
Format Patent
LanguageChinese
English
Published 12.10.2021
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:A charged particle beam device is provided. A change in the irradiation position of a charged particle beam can be suppressed by appropriately correcting a positional shift caused by rotation of a sample. The charged particle beam device (10) includes a focused ion beam column (17), a sample holder (12), a stage (31) supporting the sample holder (12), a securing member rotating unit, a stage driving unit (33), and a control device (25). The sample holder (12) includes a securing member fixing a sample (P). The securing member rotating unit rotates the securing member around a first rotational axis and a second rotational axis. The stage driving unit (33) translates the stage (31) in three dimensions and rotates the stage around a third rotational axis. The control device (25) acquires a correction value for correcting a change in a position of a center of rotation for rotation around at least one among a first rotational axis, a second rotational axis, and a third rotational axis. The control device (25) tran
Bibliography:Application Number: CN202110284278