SEMICONDUCTOR DEVICE
The invention provides a semiconductor device which can improve the breakdown tolerance during recovery operation. The semiconductor device according to the present application includes: a semiconductor substrate including a first main surface and a second main surface; a hole injection region inclu...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
28.09.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a semiconductor device which can improve the breakdown tolerance during recovery operation. The semiconductor device according to the present application includes: a semiconductor substrate including a first main surface and a second main surface; a hole injection region including a hole injection layer of a second conductivity type and a semiconductor layer of a second conductivity type provided on the second main surface side; a diode region including: an anode layer of a second conductivity type provided on the first main surface side and a cathode of a first conductivity type on the second main surface side, the diode region having no semiconductor layer of a first conductivity type between the second main surface side end portion of the anode layer and the first main surface of the anode layer; a boundary region including: a boundary portion semiconductor layer of a second conductivity type provided on the first main surface side, a carrier injection suppression layer of a first co |
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Bibliography: | Application Number: CN202110297220 |