SHOWERHEAD FOR DEPOSITION TOOLS HAVING MULTIPLE PLENUMS AND GAS DISTRIBUTION CHAMBERS

A deposition tool including a processing chamber, a substrate holder for holding a substrate to be processed within the processing chamber and a showerhead having a faceplate for distributing a first and/or second gas(es) and/or vapor(s) into the processing chamber. The showerhead includes first and...

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Bibliographic Details
Main Authors JANICKI MICHAEL J, BAILEY CURTIS W
Format Patent
LanguageChinese
English
Published 10.09.2021
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Summary:A deposition tool including a processing chamber, a substrate holder for holding a substrate to be processed within the processing chamber and a showerhead having a faceplate for distributing a first and/or second gas(es) and/or vapor(s) into the processing chamber. The showerhead includes first and second plenums, first and second chambers, each provided behind a backside of the faceplate, and first and second sets of holes, both formed through the faceplate of the showerhead, and in fluid communication with the first and second chambers respectively. 一种沉积工具包含处理室、用于在处理室内保持待处理衬底的衬底保持器、及具有用于将第一和/或第二气体和/或蒸气分配至处理室中的面板的喷头。喷头包含第一和第二充气部、各设置在面板的背侧后方的第一和第二室、以及都形成为穿过喷头的面板且分别与第一和第二室流体连通的第一和第二组孔。
Bibliography:Application Number: CN202080011969