METHOD FOR CLEANING A VACUUM SYSTEM, METHOD FOR VACUUM PROCESSING OF A SUBSTRATE, AND APPARATUS FOR VACUUM PROCESSING A SUBSTRATE
A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of an inside of the vacuum chamber and a component inside the vacuum chamber with active species at a pressure of 5 * 10-3 mbar or bel...
Saved in:
Main Authors | , , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
07.09.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A method for cleaning a vacuum chamber, particularly a vacuum chamber used in the manufacture of OLED devices is described. The method includes cleaning at least one of an inside of the vacuum chamber and a component inside the vacuum chamber with active species at a pressure of 5 * 10-3 mbar or below, particularly 1 * 10-4 mbar or below.
描述了一种用于清洁真空腔室、特别是用于OLED装置制造中的真空腔室的方法。所述方法包括在5×10-3毫巴或以下的压力下,特别是在1×10-4毫巴或以下的压力下,利用活性物种清洁所述真空腔室的内侧和在所述真空腔室内的部件中的至少一者。 |
---|---|
Bibliography: | Application Number: CN201980090563 |