COMPOSITION FOR FORMING RELEASE LAYER FOR SLIT DIE COATING, AND RELEASE LAYER

• Main Authors: SHINDO KAZUYA, EBARA KAZUYA
• Format: Patent
• Language: Chinese; English
• Published: 07.09.2021
• Subjects: ADHESIVES; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PERFORMING OPERATIONS; POLISHES; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; SPRAYING OR ATOMISING IN GENERAL; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; USE OF MATERIALS THEREFOR; WOODSTAINS

The present invention provides a composition for forming a release layer for slit die coating, which contains (A) a polyurea that contains a repeating unit represented by formula (1), (B) an acid compound or a salt thereof, (C) a crosslinking agent that is selected from among compounds having nitrogen atoms which are substituted by a hydroxyalkyl group and/or an alkoxymethyl group, (D) a polymer additive which contains a repeating unit represented by formula (a1), a repeating unit represented by formula (b) and a repeating unit represented by formula (c), and (E) a solvent that contains at least one solvent which has a vapor pressure of 800 Pa or less at 20 DEG C; and this composition is configured such that 3-100 parts by mass of the polymer additive (D) is contained per 100 parts by mass of the polyurea (A). 本发明提供用于狭缝模涂布的剥离层形成用组合物，其包含：(A)包含由下述式(1)表示的重复单元的聚脲、(B)酸化合物或其盐、(C)选自具有用羟基烷基和/或烷氧基甲基取代的氮原子的化合物中的交联剂、(D)包含由下述式(a1)表示的重复单元、由下述式(b)表示的重复单元和由下述式(c)表示的重复单元的高分子添加剂以及(E)包含至少一种20℃下的蒸汽压为800Pa以下的溶剂的溶剂，相对于(A)聚脲100质量份