Ta2O5 ceramic target material and preparation method thereof

• Main Authors: RAO XIAOFANG, LUO WEN, LIU BINGNING, ZUO NINGWEI, ZHENG WEIXING
• Format: Patent
• Language: Chinese; English
• Published: 06.08.2021
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIME, MAGNESIA; METALLURGY; REFRACTORIES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF NATURAL STONE

The invention provides a preparation method of a Ta2O5 ceramic target material. The method comprises the following steps that 1, low-temperature calcination and high-temperature calcination are sequentially carried out on Ta (OH) 5 powder to obtain Ta2O5 powder; the temperature of the low-temperature calcination is 600-750 DEG C, the time of the low-temperature calcination is 3-6 hours, and the atmosphere of the low-temperature calcination is air atmosphere; the temperature of the high-temperature calcination is 800-1200 DEG C, the time of the high-temperature calcination is 2-8 hours, and the atmosphere of the high-temperature calcination is oxygen atmosphere; and 2, deionized water and a dispersing agent are added into the Ta2O5 powder, Ta2O5 slurry is obtained, then grinding, atomization granulation, agglomeration, mold pressing, cold isostatic pressing and normal-pressure oxygen atmosphere sintering are sequentially carried out, and the Ta2O5 ceramic target material for film coating is obtained. The inven