HAIR CONDITIONING COMPOSITION FOR IMPROVED DEPOSITION OF SILICONE

A A composition providing excellent benefit agent deposition, comprising: (i) 0.01 to 10 wt % of a linear, cationic conditioning surfactant; (ii) 0.1 to 10 wt % of a linear fatty material; (iii) a particulate benefit agent selected from conditioning actives, scalp actives, encapsulated fragrance, em...

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Main Authors PRICE PAUL DAMIEN, MENDOZA FERNANDEZ CESAR ERNESTO, BARFOOT RICHARD JONATHAN, COOKE MICHAEL JAMES
Format Patent
LanguageChinese
English
Published 30.07.2021
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Summary:A A composition providing excellent benefit agent deposition, comprising: (i) 0.01 to 10 wt % of a linear, cationic conditioning surfactant; (ii) 0.1 to 10 wt % of a linear fatty material; (iii) a particulate benefit agent selected from conditioning actives, scalp actives, encapsulated fragrance, emulsified fragrance, and mixtures thereof; (iv) 0.01 to 5 wt %, at 100 % active, of a branched cationic co-surfactant, selected from structure 1 wherein: R1 and R2 comprise linear or branched alkyl chains, saturated or unsaturated, with carbon-carbon chain lengths of from C6 to C22; preferably from C6 to C12; n has a range of from 1 to 6; R3 comprises an alkyl chain having a carbon-carbon chain length of from C1 to C4, preferably C1 to C2; R4 comprises a proton or an alkyl chain having a carbon-carbon chain length of from C1 to C4, preferably C1 to C2; and X is an organic or inorganic anion; wherein the molar ratios of branched cationic co-surfactants (iv) to linear cationic surfactants (i) are in the range of from
Bibliography:Application Number: CN201980085154