Gas mixing device

• Main Authors: WANG GANGLONG, DENG XINYU
• Format: Patent
• Language: Chinese; English
• Published: 30.07.2021
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a gas mixing device. The gas mixing device comprises a gas mixing tank and a mixing screw core, wherein a left end cover is arranged at one end of the gas mixing tank; a gas outlet pipe is arranged a tone side of the left end cover; a pipe joint is arranged at the inner side of the gas outlet pipe; a right end cover is arranged at the other end of the gas mixing tank; a gas inlet pipe a is arranged on the outer wall of the gas mixing tank; a gas inlet pipe b is arranged at one side of the gas inlet pipe a; a gas inlet pipe c is arranged at one side of the gas inlet pipe b; a gas inlet pipe d is arranged at one side of the gas inlet pipe c; and the mixing screw core is arranged in the gas mixing tank. According to the gas mixing device, multiple sets of gas inlet pipes are adopted to input gas into a cavity at the same time, the gas inlet pipe a rotationally flows along the gas mixing tank and the mixing screw core and drives gas at the gas inlet pipe b, gas at the gas inlet pipe c and