X-ray source and system comprising x-ray source
The invention generally relates to an x-ray source and specifically to an x-ray source suitable for large area x-ray generation. The invention also relates to a system comprising such an x-ray source. 本发明一般涉及一种X射线源,特别地涉及一种适用于大面积X射线产生情形下的X射线源。本发明还涉及一种包括此X射线源的系统。...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
23.07.2021
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Subjects | |
Online Access | Get full text |
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Summary: | The invention generally relates to an x-ray source and specifically to an x-ray source suitable for large area x-ray generation. The invention also relates to a system comprising such an x-ray source.
本发明一般涉及一种X射线源,特别地涉及一种适用于大面积X射线产生情形下的X射线源。本发明还涉及一种包括此X射线源的系统。 |
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Bibliography: | Application Number: CN202110265118 |