PROFILE MEASUREMENT SYSTEM AND PROFILE MEASUREMENT METHOD

• Main Authors: ANGOT LUDOVIC, LAI YUEYI
• Format: Patent
• Language: Chinese; English
• Published: 16.07.2021
• Subjects: MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; TESTING

System and method for profile measurement are provided. The profile measurement system includes a light projector, an imaging device, a control system, and a processing unit. The light projector includes a light source, a mask, and an optical system. An aperture of the mask allows a portion of light to pass through and generates a pattern. The optical system includes a focal-length-variable lens element configured to project the pattern at different projection distances. The imaging device is configured to capture images of the pattern projected at the different projection distances. The control system is configured to control a projection distance of the light projector and a focus length of the imaging device. The processing unit is configured to obtain in-focus pixels in the captured images, generate mask images, reconstruct a large depth of field pattern image based on the captured images and reconstruct the object profile. 本发明提供一种用于轮廓测量的系统和方法。轮廓测量系统包含光投影机、成像装置、控制系统以及处理单元。光投影机包含光源、屏蔽罩以及光学系统。屏蔽罩的孔径允许来自光源的光