Liquid supply system

The present invention relates to a liquid supply system. A photolithography includes a storage tank storing a process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing opening located at the lowermost portion of the storage tank in the...

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Bibliographic Details
Main Authors ZHANG YUZHENG, LI SHANGSHENG, XU ZHENYI, LIN ZIYANG, WU CHENGHAN, ZENG GUOSHU, LIU ZHENYU
Format Patent
LanguageChinese
English
Published 16.07.2021
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Summary:The present invention relates to a liquid supply system. A photolithography includes a storage tank storing a process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing opening located at the lowermost portion of the storage tank in the gravity direction. The anti-collision frame is connected to the storage tank. The integrated sensor assembly is disposed on at least one of the collision avoidance frame and the storage tank to measure a change in fluid quality in response to the fluid quality measurement. 一种液体供应系统,微影技术包含储存制程化学流体的储存槽、防撞框架以及集成感测器组件。储存槽包含位于储存槽在重力方向上的最下部分的分配口。防撞框架连接至储存槽。集成感测器组件设置在防撞框架以及储存槽的至少一个上,以测量因应流体品质测量的流体品质的变化。
Bibliography:Application Number: CN202011619308