Liquid supply system
The present invention relates to a liquid supply system. A photolithography includes a storage tank storing a process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing opening located at the lowermost portion of the storage tank in the...
Saved in:
Main Authors | , , , , , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
16.07.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The present invention relates to a liquid supply system. A photolithography includes a storage tank storing a process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing opening located at the lowermost portion of the storage tank in the gravity direction. The anti-collision frame is connected to the storage tank. The integrated sensor assembly is disposed on at least one of the collision avoidance frame and the storage tank to measure a change in fluid quality in response to the fluid quality measurement.
一种液体供应系统,微影技术包含储存制程化学流体的储存槽、防撞框架以及集成感测器组件。储存槽包含位于储存槽在重力方向上的最下部分的分配口。防撞框架连接至储存槽。集成感测器组件设置在防撞框架以及储存槽的至少一个上,以测量因应流体品质测量的流体品质的变化。 |
---|---|
Bibliography: | Application Number: CN202011619308 |