Mounting table and plasma processing apparatus
The invention provides a mounting table and a plasma processing apparatus. A plurality of adhesive layers having different heights can be protected with one sealing member. The mounting table includes a first mounting portion, a second mounting portion, a first adhesive layer, a second adhesive laye...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
09.07.2021
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Subjects | |
Online Access | Get full text |
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Abstract | The invention provides a mounting table and a plasma processing apparatus. A plurality of adhesive layers having different heights can be protected with one sealing member. The mounting table includes a first mounting portion, a second mounting portion, a first adhesive layer, a second adhesive layer, and a sealing member. The first mounting portion is used for mounting a substrate. The second placing portion is lower than the first placing portion and is used for placing an edge ring surrounding the periphery of the substrate. The first adhesive layer adheres a base and the first placing portion. The second adhesive layer adheres the base and the second placing portion. The sealing member is in contact with the first placing portion at a position above the first adhesive layer, is in contact with the second placing portion at a position above the second adhesive layer, and blocks a space between the first placing portion and the second placing portion by deformation.
本发明提供载置台和等离子体处理装置。能够用一个密封构件保护高度不同的多个粘接层。载 |
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AbstractList | The invention provides a mounting table and a plasma processing apparatus. A plurality of adhesive layers having different heights can be protected with one sealing member. The mounting table includes a first mounting portion, a second mounting portion, a first adhesive layer, a second adhesive layer, and a sealing member. The first mounting portion is used for mounting a substrate. The second placing portion is lower than the first placing portion and is used for placing an edge ring surrounding the periphery of the substrate. The first adhesive layer adheres a base and the first placing portion. The second adhesive layer adheres the base and the second placing portion. The sealing member is in contact with the first placing portion at a position above the first adhesive layer, is in contact with the second placing portion at a position above the second adhesive layer, and blocks a space between the first placing portion and the second placing portion by deformation.
本发明提供载置台和等离子体处理装置。能够用一个密封构件保护高度不同的多个粘接层。载 |
Author | SUGAWA NAOKI |
Author_xml | – fullname: SUGAWA NAOKI |
BookMark | eNrjYmDJy89L5WTQ880vzSvJzEtXKElMyklVSMxLUSjISSzOTVQoKMpPTi0uBsklFhQkFiWWlBbzMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JJ4Zz9DQ2MDS3MDExNHY2LUAAAEyyyF |
ContentType | Patent |
DBID | EVB |
DatabaseName | esp@cenet |
DatabaseTitleList | |
Database_xml | – sequence: 1 dbid: EVB name: esp@cenet url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP sourceTypes: Open Access Repository |
DeliveryMethod | fulltext_linktorsrc |
Discipline | Medicine Chemistry Sciences |
DocumentTitleAlternate | 载置台和等离子体处理装置 |
ExternalDocumentID | CN113097044A |
GroupedDBID | EVB |
ID | FETCH-epo_espacenet_CN113097044A3 |
IEDL.DBID | EVB |
IngestDate | Fri Jul 19 14:29:58 EDT 2024 |
IsOpenAccess | true |
IsPeerReviewed | false |
IsScholarly | false |
Language | Chinese English |
LinkModel | DirectLink |
MergedId | FETCHMERGED-epo_espacenet_CN113097044A3 |
Notes | Application Number: CN202011578696 |
OpenAccessLink | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210709&DB=EPODOC&CC=CN&NR=113097044A |
ParticipantIDs | epo_espacenet_CN113097044A |
PublicationCentury | 2000 |
PublicationDate | 20210709 |
PublicationDateYYYYMMDD | 2021-07-09 |
PublicationDate_xml | – month: 07 year: 2021 text: 20210709 day: 09 |
PublicationDecade | 2020 |
PublicationYear | 2021 |
RelatedCompanies | TOKYO ELECTRON LTD |
RelatedCompanies_xml | – name: TOKYO ELECTRON LTD |
Score | 3.470733 |
Snippet | The invention provides a mounting table and a plasma processing apparatus. A plurality of adhesive layers having different heights can be protected with one... |
SourceID | epo |
SourceType | Open Access Repository |
SubjectTerms | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
Title | Mounting table and plasma processing apparatus |
URI | https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210709&DB=EPODOC&locale=&CC=CN&NR=113097044A |
hasFullText | 1 |
inHoldings | 1 |
isFullTextHit | |
isPrint | |
link | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR1dS8Mw8JhT1Dedis4PKkjfqmtNvx6KuLRlCO2GTNnbSJoMFZzFdgj-ei-xc77oW8jBJTm4r9wXwAXjM0fYIbOkK4hFQu5ZASfE8r1ZUBSicDwdPc9yb_BA7ibupAUvy1oY3Sf0QzdHRI4qkN9rLa_L1SdWrHMrqyv-jFtvN-k4is3GO0b_xe-FZtyPktEwHlKT0ojmZn4f2SirQ79HyO0arCszWvXZTx77qiql_K1S0h3YGCG2eb0Lrc-nDmzR5eS1DmxmTcAblw3vVXtwmTVjHYxalTsZbC6MEm3fV2aU39n-CsZK3cx7Ue3DeZqM6cDCg6c_r5zSfHXH6wNoo_cvD8EgM1nYhPm29DhBbycQgesL6Qg0NJF7giPo_o2n-x_wGLYVxXTuaXgC7fp9IU9Rw9b8TJPmC0Y4f-k |
link.rule.ids | 230,309,786,891,25594,76906 |
linkProvider | European Patent Office |
linkToHtml | http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfR1dT4Mw8DKncb7p1Oj8wsTwhg4sFB6IcWUEdbDFoNkbAQpREycRFhN_vUdlzhd9a3rJtb3kvnpfAGdxkmtctWIl0zlRiJUYipkQolAjN9OUp5ohoud-YHgP5HaqT1vwsqiFEX1CP0RzROSoFPm9EvK6WH5iOSK3srxInnHr7coNbUduvGP0X2jfkp2BPZyMnTGTGbNZIAf3toqy2qJ9Qq5XYJXW3Xlr0-lxUFelFL9VirsJaxPENqu2oPX51IUOW0xe68K63wS8cdnwXrkN534z1kGq6nInKZ5xqUDb9zWWiu9s_xoWF6KZ97zcgVN3GDJPwYOjn1dGLFje8XIX2uj9Z3sgkTxLVRJTNTMSgt6OyU2d8kzjaGgi95j70PsbT-8_4Al0vNAfRaOb4O4ANmrqiTxU6xDa1fs8O0JtWyXHgkxfaaiC1g |
openUrl | ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Mounting+table+and+plasma+processing+apparatus&rft.inventor=SUGAWA+NAOKI&rft.date=2021-07-09&rft.externalDBID=A&rft.externalDocID=CN113097044A |