Composite photoresist for preparing multi-material three-dimensional micro-nano structure and application of composite photoresist
The invention belongs to the technical field of laser direct writing, and particularly relates to a composite photoresist for preparing a multi-material three-dimensional micro-nano structure and application of the composite photoresist. The method comprises the following steps: uniformly mixing a f...
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Format | Patent |
Language | Chinese English |
Published |
02.07.2021
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Abstract | The invention belongs to the technical field of laser direct writing, and particularly relates to a composite photoresist for preparing a multi-material three-dimensional micro-nano structure and application of the composite photoresist. The method comprises the following steps: uniformly mixing a free radical monomer, a free radical photoinitiator, a free radical crosslinking agent, a cationic monomer and a cationic photoinitiator to obtain a composite photoresist, focusing femtosecond laser in the composite photoresist, and controlling the wavelength, power and processing speed of the femtosecond laser to respectively polymerize and crosslink a free radical system and a cationic system. Therefore, three-dimensional micro-nano structures of different materials are formed. According to the method disclosed by the invention, multi-component high-precision material integration can be realized in the same micro-nano structure only by using one photoresist precursor, and the operation steps are simple only throug |
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AbstractList | The invention belongs to the technical field of laser direct writing, and particularly relates to a composite photoresist for preparing a multi-material three-dimensional micro-nano structure and application of the composite photoresist. The method comprises the following steps: uniformly mixing a free radical monomer, a free radical photoinitiator, a free radical crosslinking agent, a cationic monomer and a cationic photoinitiator to obtain a composite photoresist, focusing femtosecond laser in the composite photoresist, and controlling the wavelength, power and processing speed of the femtosecond laser to respectively polymerize and crosslink a free radical system and a cationic system. Therefore, three-dimensional micro-nano structures of different materials are formed. According to the method disclosed by the invention, multi-component high-precision material integration can be realized in the same micro-nano structure only by using one photoresist precursor, and the operation steps are simple only throug |
Author | LIU YUNCHENG DENG LEIMIN YU KEWANG XIONG WEI XU YINUO WANG YINGCHEN JIAO BINZHANG FAN XUHAO GAO HUI |
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DocumentTitleAlternate | 一种用于制备多材料三维微纳结构的复合型光刻胶及其应用 |
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Snippet | The invention belongs to the technical field of laser direct writing, and particularly relates to a composite photoresist for preparing a multi-material... |
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SubjectTerms | ADDITIVE MANUFACTURING TECHNOLOGY ADDITIVE MANUFACTURING, i.e. MANUFACTURING OFTHREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVEAGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING,STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL |
Title | Composite photoresist for preparing multi-material three-dimensional micro-nano structure and application of composite photoresist |
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