METHOD AND APPARATUS FOR POURING A SPATTER FREE POLYMERIC MIXTURE
A method for pouring in a controlled way, into an open moulding cavity (19), a liquid polymeric mixture free from spatters (SP), resulting from a first (A) and at least a second (B) chemically reactive components suitable for forming a polymeric resin, by means of a high pressure mixing device (10)....
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
22.06.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A method for pouring in a controlled way, into an open moulding cavity (19), a liquid polymeric mixture free from spatters (SP), resulting from a first (A) and at least a second (B) chemically reactive components suitable for forming a polymeric resin, by means of a high pressure mixing device (10). During an initial transitional step, a flow (F) of liquid mixture, free from spatters (SP), is poured with initial flowrate (Q1) and speed (V1) values comparatively lower than regime operative values (Q2-V2), suitable for forming a pool of mixture (PZ2) having a wave front (FO) with a raised peripheral peak (PC); then the flowrate (Q) and the speed (V) of the initially poured flow (F), are increased up to regime operative values (Q2, V2) maintaining conditions free from spatters of the poured mixture flow (F). The apparatus comprises a high pressure mixing device (10), pumps (P1, P2) for feeding the chemical components (A,B), and flow transducers (FTA, FTB) operatively connected to a control unit (CU) programmable |
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Bibliography: | Application Number: CN202011519644 |