Objective table position measuring device and photoetching machine
The invention provides an objective table position measuring device and a photoetching machine. The measuring device comprises an objective table, at least one reflection assembly and at least one interferometer, wherein theobjective table comprises a top surface and a plurality of side surfaces, th...
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Format | Patent |
Language | Chinese English |
Published |
11.06.2021
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Online Access | Get full text |
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Abstract | The invention provides an objective table position measuring device and a photoetching machine. The measuring device comprises an objective table, at least one reflection assembly and at least one interferometer, wherein theobjective table comprises a top surface and a plurality of side surfaces, the top surface is connected with the side surfaces, and the top surface of the objective table is used for bearing a photoetching element; the objective table moves in the X direction, the Y direction and the Z direction, and the X direction, the Y direction and the Z direction form a Cartesian coordinate system; the at least one reflection assembly is fixed on the side surface of the objective table; the at least one interferometer is located on the side, away from the objective table, of the reflection assembly and used for emitting a measuring light beam to the reflection assembly and measuring the position of the objective table according to the measuring light beam reflected by the reflection assembly; the incl |
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AbstractList | The invention provides an objective table position measuring device and a photoetching machine. The measuring device comprises an objective table, at least one reflection assembly and at least one interferometer, wherein theobjective table comprises a top surface and a plurality of side surfaces, the top surface is connected with the side surfaces, and the top surface of the objective table is used for bearing a photoetching element; the objective table moves in the X direction, the Y direction and the Z direction, and the X direction, the Y direction and the Z direction form a Cartesian coordinate system; the at least one reflection assembly is fixed on the side surface of the objective table; the at least one interferometer is located on the side, away from the objective table, of the reflection assembly and used for emitting a measuring light beam to the reflection assembly and measuring the position of the objective table according to the measuring light beam reflected by the reflection assembly; the incl |
Author | HUANG XUNZHI ZHENG HONGYI DANG BAOSHENG |
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DocumentTitleAlternate | 一种载物台位置的测量装置及光刻机 |
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RelatedCompanies | SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD |
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Snippet | The invention provides an objective table position measuring device and a photoetching machine. The measuring device comprises an objective table, at least one... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING |
Title | Objective table position measuring device and photoetching machine |
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