Objective table position measuring device and photoetching machine
The invention provides an objective table position measuring device and a photoetching machine. The measuring device comprises an objective table, at least one reflection assembly and at least one interferometer, wherein theobjective table comprises a top surface and a plurality of side surfaces, th...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
11.06.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The invention provides an objective table position measuring device and a photoetching machine. The measuring device comprises an objective table, at least one reflection assembly and at least one interferometer, wherein theobjective table comprises a top surface and a plurality of side surfaces, the top surface is connected with the side surfaces, and the top surface of the objective table is used for bearing a photoetching element; the objective table moves in the X direction, the Y direction and the Z direction, and the X direction, the Y direction and the Z direction form a Cartesian coordinate system; the at least one reflection assembly is fixed on the side surface of the objective table; the at least one interferometer is located on the side, away from the objective table, of the reflection assembly and used for emitting a measuring light beam to the reflection assembly and measuring the position of the objective table according to the measuring light beam reflected by the reflection assembly; the incl |
---|---|
Bibliography: | Application Number: CN201911174653 |