Objective table position measuring device and photoetching machine

• Main Authors: HUANG XUNZHI, ZHENG HONGYI, DANG BAOSHENG
• Format: Patent
• Language: Chinese; English
• Published: 11.06.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TESTING

The invention provides an objective table position measuring device and a photoetching machine. The measuring device comprises an objective table, at least one reflection assembly and at least one interferometer, wherein theobjective table comprises a top surface and a plurality of side surfaces, the top surface is connected with the side surfaces, and the top surface of the objective table is used for bearing a photoetching element; the objective table moves in the X direction, the Y direction and the Z direction, and the X direction, the Y direction and the Z direction form a Cartesian coordinate system; the at least one reflection assembly is fixed on the side surface of the objective table; the at least one interferometer is located on the side, away from the objective table, of the reflection assembly and used for emitting a measuring light beam to the reflection assembly and measuring the position of the objective table according to the measuring light beam reflected by the reflection assembly; the incl